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Topic: wetting agent for etching solution  (Read 2141 times)

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Offline mormegil

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wetting agent for etching solution
« on: June 13, 2012, 12:10:34 PM »
Hello

I am looking for a wetting agent for reduction of surface tension on a glass plate-etching solution interface. My etching solution is a water based mixture of acetic acid and ammonia fluoride. I have found that Isopropyl alcohol is very good but it dissolves a photoresist film deposited on etched glass plate. Can you suggest different wetting agents. I will be grateful for any help.

Best regards

Cuma

Offline Enthalpy

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Re: wetting agent for etching solution
« Reply #1 on: July 06, 2012, 03:19:49 PM »
If nobody suggests a better answer, then my 2 cents worth of contribution...

What about treating the surface before coating it with with the photoresist? This would allow a wider choice for the wetting agent. It doesn't have to stay in place: you just need it to alter the surface minimally.

Maybe a very short dip into your etching mixture, if needed more dilute, would be acceptable before coating, and help subsequent wetting.

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