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Topic: Graphene Oxide drying  (Read 3609 times)

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Offline Jakubz

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Graphene Oxide drying
« on: August 13, 2013, 03:04:51 PM »
Hallo
Is it safe for graphene oxide structure, if i dry neutral (ph~7) solution under evaporator, with temp ~60oC to remove rests of water and some particles of HCL? As you know GO at this pH is strongly hydrophillic, so it is hard to filter it. I used Hummer's method.

And is it possible to remove weak HCL solution making it close to neutral?
So is it safe for graphene structure if i want to neutralize solution by evaporating HCL under pressure using evaporator?


Offline raaaainm

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Re: Graphene Oxide drying
« Reply #1 on: August 13, 2013, 04:10:58 PM »
The HCl bonds strongly with the surface moeities on the GO surface, so it is difficult to neutralize GO after the Hummer's method. Your best bet is vacuum filtration with repeated washes of H2O, and vacuum drying of the paste at around 40C to prevent partial reductions due to acid-catalyzed dehydration.

The drying procedure is very important to maintain quality of the GO sheets, as those dried at high temperatures can pi-stack to reform multi-layer graphite, i.e. they will not be easily water-dispersable.

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