I want to build up a microfabrication process that includes Ti, Au, Cu and In. In the process I need to wet etch the Ti and Cu with CR7 (Cyantek) and 10:1 (H2O and HF). The thing is that I will have to immerge the Indium layer in these two etchants. I know that HCL slowly etches Indium but I don't know if CR7 and HF do as well. I hope they don't.
Can you guys help me out?